Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

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Table 4 from Optimization of plasma-enhanced chemical vapor deposition silicon oxynitride layers for integrated optics applications

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PDF) Chemical and morphological properties of amorphous silicon oxynitride films deposited by plasma enhanced chemical vapor deposition

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PDF) Chemical and morphological properties of amorphous silicon oxynitride films deposited by plasma enhanced chemical vapor deposition